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Fabrication of periodic nanostructures using dynamic plowing lithography with the tip of an atomic force microscope

机译:使用原子力显微镜尖端的动态犁刻蚀技术制造周期性纳米结构

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摘要

The fabrication of periodic nanostructures with a fine control of their dimensions is performed on poly(methyl methacrylate) (PMMA) thin films using an atomic force microscope technique called dynamic plowing lithography (DPL). Different scratching directions are investigated first when generating single grooves with DPL. In particular, the depth, the width and the periodicity of the machined grooves as well the height of the pile-up, formed on the side of the grooves, are assessed. It was found that these features are not significantly affected by the scratching direction, except when processing took place in a direction away from the cantilever probe and parallel to its main axis. For a given scratching direction, arrays of regular grooves are then obtained by controlling the feed, i.e. the distance between two machining lines. A scan-scratch tip trace is also used to reduce processing time and tip wear. However, irregular patterns are created when combining two layers oriented at different angles and where each layer defines an array of grooves. Thus, a “combination writing” method was implemented to fabricate arrays of grooves with a well-defined wavelength of 30 nm, which was twice the feed value utilized. Checkerboard, diamond-shaped, and hexagonal nanodots were also fabricated. These were obtained by using the combination writing method and by varying the orientation and the number of layers. The density of the nanodots achieved could be as high as 1.9 × 109 nanodots per mm2.
机译:使用称为动态犁刻蚀(DPL)的原子力显微镜技术,对聚甲基丙烯酸甲酯(PMMA)薄膜进行具有精细尺寸控制的周期性纳米结构的制造。使用DPL生成单个凹槽时,首先要研究不同的刮擦方向。特别地,评估了在凹槽的侧面上形成的凹槽的深度,宽度和周期性以及堆积的高度。发现这些特征不受刮擦方向的显着影响,除非加工是在远离悬臂探针且平行于其主轴的方向上进行的。对于给定的刮擦方向,然后通过控制进给,即两条加工线之间的距离,获得规则凹槽的阵列。扫描刮擦的尖端痕迹也可用于减少加工时间和尖端磨损。然而,当组合以不同角度定向的两个层并且其中每个层限定凹槽阵列时,会产生不规则图案。因此,实施了“组合写入”方法来制造具有明确定义的30 nm波长的凹槽阵列,该波长是所使用的进给值的两倍。还制作了棋盘,菱形和六角形的纳米点。这些是通过使用组合写入方法并通过更改方向和层数获得的。所获得的纳米点的密度可以高达每平方毫米1.9×109纳米点。

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